Fig. 19From: Photoelectrochemical properties of mesoporous NiO x deposited on technical FTO via nanopowder sintering in conventional and plasma atmospheresNyquist plots in the high (upper plot), and low (lower plot) frequency range for ERY sensitized RDS NiO x at 2.4, 2.9, 3.3 and 3.6 V vs Li+/Li. Arrows indicate the verse of growing frequencies for the different profilesBack to article page