Fig. 30From: Photoelectrochemical properties of mesoporous NiO x deposited on technical FTO via nanopowder sintering in conventional and plasma atmospheres JV characteristic curve of the p-DSC with RDS NiO x deposited onto FTO as photoelectroactive cathode. NiO x film thickness: 1.5 ± 0.3 μm; dye-sensitizer: fast green; solar simulator intensity: 0.1 W cm−2. η = 0.018 %; V OC = 0.098 V; J SC = 0.51 mA cm−2; FF = 36.7 %Back to article page