Fig. 29From: Photoelectrochemical properties of mesoporous NiO x deposited on technical FTO via nanopowder sintering in conventional and plasma atmospheres JV characteristic curve of the p-DSC with RDS NiO x deposited onto FTO as photoelectroactive cathode. NiO x film thickness: 2.5 ± 0.3 μm; dye-sensitizer: ERY; solar simulator intensity: 0.1 W cm−2. η = 0.045 %; V OC = 0.120 V; J SC = 1.05 mA cm−2; FF = 36.0 %Back to article page