Fig. 10From: Photoelectrochemical properties of mesoporous NiO x deposited on technical FTO via nanopowder sintering in conventional and plasma atmospheresCyclic voltammetry of ERY-sensitised RDS-NiOx deposited on FTO substrate [scan rate: a 12 and b 25 mV s−1]. OCV: 3.21(dark)/3.24(illuminated) V vs Li+/Li. Radiation source was a halogen white lamp with total intensity of 25 W cm−2. Arrows indicate the verse of scanBack to article page